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Photolithography etching static elimination
Thời gian phát hành:2025-04-26 Lượt xem:0

Photolithography etching static elimination
Concern

1. A batch of “dual analog switch” circuits were mounted on a PCB, and after conformal coating, a few samples showed deterioration in input characteristics.

2. After removing the aluminum, very small breakdown holes were found in the oxide layer on the n+ ring

prescription

1. After failure analysis, it was found that a short circuit and leakage occurred at the input (base) where the aluminum metallization spans the diffusion layer of the n+ protection ring.

2. Photolithographic etching is faster and electrostatic discharge damage occurs.

3. Photolithographic etching is faster and electrostatic discharge damage can occur.

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Trước:Static electricity removal for silicon wafer handling
Tiếp theo:Không còn lại